해외 우수한 분석, 측정, 계측기기 제조회사의 독점 대리점 !
SRM300 | |
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Detector | CCD Array with 2048 pixels |
Light Source | DC regulated Tungsten-Halogen |
Light Delivery | Optics |
Stage | Black Anodized Aluminum Alloy Vacuum chuck holds 300 mm wafer |
Communication | USB |
Measurement Type | Film thickness, reflection spectrum, refractive index |
Software | TFProbe 2.X/3.X |
Computer | Intel Core 2 Duo Processor with 300GB Hard drive and DVD+RW Burner plus 20” LCD Monitor |
Power | 110 - 240 VAC /50-60Hz, 3 A |
SRM300 | |
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Wavelength range | 400 to 1050 nm |
Spot Size | 500 μm to 5 mm |
Sample Size | 300 mm in diameter |
Substrate Size | Up to 50 mm thick |
Measurable thickness range | 50 nm to 50 μm |
Measurement Time | 2ms - 1s /site typical |
Accuracy | Better than 0.5% (comparing with ellipsometry results for Thermal Oxide sampleby using the same optical constants) |
Repeatability | <2Å (1 sigma from 50 thickness readings at center for 1500 Å Thermal SiO2 on Si Wafer) |
SRM300 |
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Large Spot Accessories for featured structure measurement |
Small spot accessories for highly non uniform samples |
Other Sample Size: 200mm wafer (SRM300-200) |
SRM300 |
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Biological films and materials |
Optical coatings, TiO2, SiO2, Ta2O5..... |
Semiconductor compounds |
Functional films in MEMS/MOEMS |
Amorphous, nano and crystalline Si |
2D thicknesses plot for Nitride layer in a three layer stack (Nitride-Oxide-Nitride on Glass) | |
2D contour plot for Nitride layer in a three layer stack (Nitride-Oxide-Nitride on Glass) | |