해외 우수한 분석, 측정, 계측기기 제조회사의 독점 대리점 !
SE200BM-M300 | |
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Detector | Detector Array |
Light Source | High Power DUV-Vis-NIR Combined Light Source |
Incident Angle Change | Manual |
Stage | Automatic Mapping with Rho-Theta configuration |
Software | TFProbe 3.3.x |
Computer & Monitor | Intel Duo Core 2.0 GHz Processor, 19" Wide Screen LCD |
Power | 110 - 240 VAC /50-60Hz, 6 A |
SE300BM | |
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Wavelength range | 250 to 1100 nm |
Wavelength resolution | 1 nm |
Spot Size | 1 to 5 mm variable |
Incident Angle Range | 0 to 90 degree |
Incident Angle Change Resolution | 5 degree interval |
Sample Size | Up to 300 mm in diameter or 150mm square |
Substrate Size | Up to 20 mm thick |
Measurable thickness range | 0 nm to 20 μm |
Measurement Time | ~ 1s/Site |
Accuracy | Better than 0.25% |
Repeatability | < 1 Å (1 sigma from 50 thickness readings for 1500 Å Thermal SiO2 on Si Wafer) |
SE200BM-M300 |
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Photometry measurement for Reflection and/Or Transmission Measurement |
Micro spot for measuring small area |
Automatic Goniometer for Incident angle changes |
Mapping X-Y Stage (X-Y mode, instead of Rho-Theta mode) |
Heating /Cooling Stage |
Vertical Sample Mounting Goniometer |
Wavelength extension to further DUV or IR range |
Scanning Monochromator Setup |
Combined with Microspectrophotometer (MSP) for patterned sample measurement with digital imaging functions |
SE200BM-M300 |
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Forensics, Biological films and materials |
Inks, Mineralogy, Pigments, Toners |
Optical coatings, TiO2, SiO2, Ta2O5..... |
Semiconductor compounds |
Functional films in MEMS/MOEMS |
Amorphous, nano and crystalline Si |