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홈 제품소개 박막두께측정기

박막두께측정기

광학, 온도, 계측 사업의 선두주자 진영테크를 소개합니다.

Mapping System

제품이미지

Film Thickness Mapping Tool

SRM100

  • 5 layers 이하의 막 두께 및 반사스펙트럼 측정
  • 선형, 극성, 정사각형 또는 임의의 좌표로 매핑?
  • 250 - 1050nm의 파장영역
  • 샘플크기는300ø 까지
  • 윈도우 기반의 소프트웨어와 함께 작동하기 용이
BEST Good
제품구성
제품구성
SRM100
Detector CCD Array with 2048 pixels
Light Source High Power DUV and DC regulated Tungsten-Halogen
Light Delivery Optics
Stage

Black Anodized Aluminum Alloy Vacuum chuck holds 200 mm wafer

Communication USB & RS232
Measurement Type Film thickness, reflection spectrum, refractive index
Software TFProbe 2.X/3.X
Computer Intel Core 2 Duo Processor with 200GB Hard drive and DVD+RW Burner plus 20” LCD Monitor
Power 110 - 240 VAC /50-60Hz, 3 A
제품사양
제품사양
SRM100
Wavelength range 250 to 1050 nm
Spot Size 500 μm to 5 mm
Sample Size Up to 300 mm in diameter
Substrate Size

Up to 50 mm thick

Measurable thickness range 10 nm to 50 μm
Measurement Time 2 ms - 1 s / site typical
Accuracy

Better than 0.5% (comparing with ellipsometry results for

Thermal Oxide sample by using the same optical constants)

Repeatability <2Å (1 sigma from 50 thickness readings for 1500 Å Thermal SiO2 on Si Wafer)
옵션
옵션
SRM100
  • Additional Models with Wavelength Extension to DUV or NIR Range: SRM100D: 190 nm - 850 nm
  • SRM400: 900 nm - 1700 nm
  • SRM500: 400 nm - 1700 nm
  • Customized size: Available
Large Spot Accessories for featured structure measurement

Small spot accessories for highly non uniform samples

적용분야
적용분야
SRM100
  • Semiconductor fabrication (PR, Oxide, Nitride..)
  • Liquid crystal display (ITO, PR, Cell gap.....)
Biological films and materials

Optical coatings, TiO2, SiO2, Ta2O5.....

Semiconductor compounds
Functional films in MEMS/MOEMS

Amorphous, nano and crystalline Si

적용사례
적용사례
2D thicknesses plot for Nitride layer in a three layer stack (Nitride-Oxide-Nitride on Glass)
2D contour plot for Nitride layer in a three layer stack (Nitride-Oxide-Nitride on Glass)